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The method of moments (MoM) discretizes all the finite-sized objects of a planar structure (excluding the background structure) into a set of elementary cells. The Both the quality and resolution of the generated mesh greatly affect the accuracy of the MoM numerical solution depends greatly on . The mesh density gives a measure of the quality and resolution number of cells per effective wavelength that are placed in various regions of your planar structure. The higher the generated meshdensity, the more cells are created on the finite-sized geometrical objects. As a rule of thumb, a mesh density of about 20-30 cells per effective wavelength usually yields satisfactory results. Yet, But for structures with lots of fine geometrical details or for highly resonant structures, higher mesh densities may be required. Also, the The particular simulation output data that you seek in a project simulation also influence your choice of mesh resolution. For example, far field characteristics like radiation patterns are less sensitive to the mesh density than field distributions on a structure structures with a highly irregular shape shapes and a rugged boundaryboundaries.

EM.Picasso generates provides two types of mesh for a planar structure: a pure triangular surface mesh and a hybrid triangular-rectangularsurface mesh. In both case, EM.Picasso attempts to create a highly regular mesh, in which most of the cells have almost equal areas. The hybrid mesh type tries to produce as many rectangular cells as possible especially in the case of objects with rectangular or linear boundaries. In connection or junction areas between adjacent objects or close to highly curved boundaries, the use of triangular cells is clearly inevitable. EM.Picasso's default mesh type is hybrid. The uniformity or regularity of mesh is an important factor in warranting a stable MoM numerical solution.  The mesh density gives a measure of the number of cells per effective wavelength that are placed in various regions of your planar structure. The higher the mesh density, the more cells are created on the geometrical objects. Keep in mind that only the finite-sized objects of your structure are discretized. The free-space wavelength is defined as <math>\lambda_0 = \tfrac{2\pi f}{c}</math>, where f is the center frequency of your project and c is the speed of light in the free space. The effective wavelength is defined as <math>\lambda_{eff} = \tfrac{\lambda_0}{\sqrt{\varepsilon_{eff}}}</math>, where e_eff is the effective permittivity. By default, [[EM.Picasso]] generates a hybrid mesh with a mesh density of 20 cells per effective wavelength. The effective permittivity is defined differently for different types of traces and embedded object sets. This is to make sure that enough cells are placed in areas that might feature higher field concentration. For PEC and conductive sheet traces, the effective permittivity is defined as the larger of the permittivity of the two substrate layers just above and below the metallic trace. For slot traces, the effective permittivity is defined as the mean (average) of the permittivity of the two substrate layers just above and below the metallic trace. For embedded object sets, the effective permittivity is defined as the largest of the permittivities of all the substrate layers and embedded dielectric sets.